Sputtering Unit
Sputtering Unit
Specification:
- Vacuum Chamber :Box Type/ “D” Shape / Spherical Chamber
- Pumping System :Diffusion / Turbo Pumping System
- Vacuum Gauges :Digital / Analog – Pirani & Penning Gauges
- Substrate Holder with Spring clips arrangement
- Substrate Heating & Rotation Mechanism
- Flexible Magnetron Cathodes with shutter :1”/ 2″ / 3″
- Substrate to Cathode distance arrangement
- Mass Flow Controllers for gas introducing
- RF 300Watts / RF 600Watts Power Supply with auto matching network
- DC 1kW Power Supply
- DTM
- Control Console with Mounting Stand
